Layout decomposition for multiple patterning lithography
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United States of America Patent
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Jun 13, 2017
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N/A
app pub date -
Sep 22, 2014
filing date -
Feb 19, 2013
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Abstract
Aspects of the disclosed techniques relate to techniques of layout decomposition for multiple patterning lithography. Data of a coloring graph are derived from layout data for a layout design. The coloring graph is simplified by repeatedly applying a plurality of graph simplification units. Each of the graph simplification units is configured to use a unique approach to simplify a graph. Based on the simplified coloring graph, the layout design is decomposed to generate decomposition information. The decomposition process may comprise applying a heuristic method for coloring if needed. The decomposition information may comprise information of one or more layout regions that cannot be decomposed.
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