Lithography system with differential interferometer module
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United States of America Patent
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Jun 13, 2017
Grant Date -
Oct 4, 2012
app pub date -
Mar 30, 2012
filing date -
Mar 30, 2011
priority date (Note) -
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status (Latency Note)
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Abstract
The invention relates to a lithography system comprising an optical column, a moveable target carrier for displacing a target such as a wafer, and a differential interferometer module, wherein the interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to an interferometer module and method for measuring such a displacement and rotations.
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