Resist composition, method for forming resist pattern, acid generator and compound
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jun 13, 2017
Grant Date -
Sep 22, 2016
app pub date -
Mar 16, 2016
filing date -
Mar 20, 2015
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including a compound (B0-1) represented by general formula (b0) shown below (in the formula, Yx01 represents a divalent linking group; n represents an integer of 1 to 3; and M′m+ represents an organic cation having a valency of m.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully