Target element types for process parameter metrology
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United States of America Patent
Stats
-
Jun 13, 2017
Issued Date -
N/A
app pub date -
Jul 9, 2015
filing date -
Dec 1, 2013
priority date (Note) -
In Force
status (Latency Note)
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Abstract
Metrology targets, target design methods and metrology methods are provided. Metrology targets comprise target elements belonging to two or more target element types. Each target element type comprises unresolved features which offset specified production parameters to a specified extent and thus provide sensitivity monitoring and optimization tools for process parameters such as focus and dose.
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International Classification(s)
- 2015 Application Filing Year
- H01L Class
- 25498 Applications Filed
- 22451 Patents Issued To-Date
- 88.06 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 18 Citation Count
- H01L Class
- 82.66 % this patent is cited more than
- 8 Age
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