A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component containing a polymeric compound having a structural unit derived from a compound represented by general formula (a0-1). R¹ and R² each independently represents a group represented by general formula (a0-2) or a functional group; V¹ and V² each represents a single bond or an alkylene group of C₁ to C₁₀ which may have a substituent; Y¹ represents a single bond or a divalent linking group; Y₂ represents a fluorinated alkylene group of C₁ to C₄ which may have a substituent; L¹ represents O or a group represented by —NR′¹—(R′¹ represents H or an alkyl group of C₁ to C₅); M^m+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.

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