Techniques and apparatus for managing lasing gas concentrations
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United States of America Patent
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Jun 6, 2017
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app pub date -
Oct 25, 2013
filing date -
Oct 26, 2012
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Abstract
Techniques and architecture are disclosed for managing alkali vapor concentration in a lasing gas at non-condensing levels. In some instances, the disclosed techniques/architecture can be used to control and/or stabilize the concentration of alkali vapor in a lasing gas volume to any desired fraction of its saturation value under dynamically changing thermal loads. In some such instances, the concentration of alkali vapor in a given lasing gas volume can be maintained at a value which is sufficiently far from the saturation point to prevent or otherwise reduce condensation of the alkali vapor, for example, upon accelerating the lasing gas through a pressure drop into an optical pumping cavity of an alkali vapor laser system (e.g., such as a diode-pumped alkali laser, or DPAL, system). In some instances, the disclosed techniques/architecture can be used to establish a temperature gradient and/or an alkali vapor concentration gradient in the flowing lasing gas volume.
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