Arc management with voltage reversal and improved recovery
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United States of America Patent
Stats
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Jun 6, 2017
Issued Date -
N/A
app pub date -
Apr 11, 2016
filing date -
Aug 31, 2012
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Systems and methods for arc handling in plasma processing operations are disclosed. The method includes providing current with a power supply to a plasma load at a first voltage polarity and energizing an energy storage device so when it is energized, the energy storage device applies a reverse polarity voltage that has a magnitude that is as least as great as the first voltage polarity. When an arc is detected, power is applied from the energy storage device to the plasma load with a reverse polarity voltage that has a polarity that is opposite of the first voltage polarity, the application of the reverse polarity voltage to the plasma load decreases a level of the current that is provided to the plasma load.
First Claim
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International Classification(s)
Cited Art Landscape
Patent Citation Ranking
- 20 Citation Count
- H01J Class
- 87.58 % this patent is cited more than
- 8 Age
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| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Dec 6, 2024 |
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