Photoresist employing photodimerization chemistry and method for manufacturing organic light emitting diode display using the same
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United States of America Patent
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May 30, 2017
Grant Date -
Dec 10, 2015
app pub date -
Aug 19, 2015
filing date -
Nov 30, 2012
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Abstract
A highly fluorinated photoresist employing a photodimerization chemistry and a method for manufacturing an organic light emitting diode display using the same. The photoresist includes a copolymer that is made from two different monomers. When the copolymer is used as a photoresist, the photoresist has the characteristic that it becomes insoluble when exposed to an ultraviolet light having a wavelength of 365 nm.
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