Methods and apparatus for uniformly metallization on substrates

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United States of America Patent

PATENT NO 9666426
SERIAL NO

14127285

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Abstract

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An apparatus for substrate metallization from electrolyte is provided. The apparatus comprises: an immersion cell containing metal salt electrolyte; at least one electrode connecting to at least one power supply; an electrically conductive substrate holder holding at least one substrate to expose a conductive side of the substrate to face the at least one electrode; an oscillating actuator for oscillating the substrate holder with an amplitude and a frequency; at least one ultrasonic device with an operating frequency and an intensity, disposed in the metallization apparatus; at least one ultrasonic power generator connecting to the ultrasonic device; at least one inlet for metal slat electrolyte feeding; and at least one outlet for metal salt electrolyte draining.

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Patent Owner(s)

Patent OwnerAddress
ACM RESEARCH (SHANGHAI) INCBLD 4 NO 1690 CAI LUN ROAD ZHANGJIANG HIGH-TECH PARK SHANGHAI 201203

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
He, Chuan Shanghai, CN 143 1886
Ma, Yue Shanghai, CN 269 3729
Wang, Hui Shanghai, CN 1115 8921
Wang, Xi Shanghai, CN 356 3114

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