Photomasks for reducing thermal stress generated by heat
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United States of America Patent
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May 30, 2017
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N/A
app pub date -
Jun 17, 2015
filing date -
Feb 24, 2015
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Abstract
A photomask includes a light transmission substrate having a transfer region and a frame region, a light-transmitting region exposing a portion of the light transmission substrate in the transfer region corresponding to a transfer pattern, and a light-blocking region disposed in the transfer region and surrounding the light-transmitting region, wherein the light-blocking region includes a first light-blocking region surrounding the light-transmitting region, and a second light-blocking region that surrounds the first light-blocking region, and wherein a first light-blocking pattern is disposed on the light transmission substrate in the first light-blocking region, and a plurality of second light-blocking patterns are disposed on the light transmission substrate in the second light-blocking region.
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