Substrate for CVD deposition of diamond and method for the preparation thereof

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United States of America Patent

PATENT NO 9663851
SERIAL NO

13884369

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Abstract

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A substrate for depositing diamond by CVD, comprising a base body of hard material and a coating layer that holds diamond particles as seed crystal in a matrix and is deposited joined thereto on a surface of said base body, wherein:

    the seed diamond particles have an average particle size of 1 μm or smaller;the matrix comprises a first metal selected from a first group of Si, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo and W and/or a first compound between said first metal and a non-metallic substance selected from boron, carbon and nitrogen, said matrix holding the diamond particles distributed therein; anda joint zone developed as a result of a diffusion process and extending over said base body and coating layer comprises either or both atoms of said first metal and a component metal of the hard material.

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Patent Owner(s)

Patent OwnerAddress
TOMEL DIAMOND CO LTD9-18 AKASAKA 3-CHOME MINATO-KU TOKYO 1070052
NATIONAL UNIVERSITY OF SCIENCE AND TECHNOLOGYLENINSKY PROSPECT 4 MOSCOW 119049
GENERAL PHYSICS INSTITUTE OF RUSSIAN ACADEMY OF SCIENCEVAVILOVA STR 38 MOSCOW 119991

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ashkinazi, Evgeny E Moscow, RU 1 2
Azarova, Ekaterina V Moscow, RU 1 2
Bol'Shakov, Andrey Moscow, RU 1 2
Hosomi, Satoru Oyama, JP 12 86
Ishizuka, Hiroshi Tokyo, JP 65 762
Levashov, Evgeny A Moscow, RU 5 42
Ralchenko, Victor G Moscow, RU 1 2

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