Methods and systems for printing periodic patterns
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United States of America Patent
Stats
-
May 23, 2017
Grant Date -
Mar 3, 2016
app pub date -
Mar 18, 2014
filing date -
Mar 18, 2013
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method for printing a periodic pattern of features into a photosensitive layer includes providing a mask bearing a periodic pattern, providing a substrate bearing the photosensitive layer, and arranging the substrate substantially parallel to the mask. A beam of collimated monochromatic light is formed for illuminating the mask pattern so that the light-field transmitted by the mask forms Talbot image planes separated by a Talbot distance. N sub-exposures of the mask with the beam are performed and the separation between sub-exposures are changed so that the relative separation during the ith sub-exposure with respect to that during the first sub-exposure is given by (mi+ni/N) times the Talbot distance. The mask pattern is exposed to the same energy density of illumination for each sub-exposure, wherein the period is selected in relation to the wavelength so that only the zeroth and first diffraction orders are transmitted by the mask.
First Claim
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International Classification(s)
Cited Art Landscape
Patent Citation Ranking
- 2 Citation Count
- G03B Class
- 18.75 % this patent is cited more than
- 8 Age
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