Atomic flux measurement device
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United States of America Patent
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May 23, 2017
Grant Date -
May 16, 2013
app pub date -
Jan 3, 2013
filing date -
Jul 5, 2010
priority date (Note) -
In Force
status (Latency Note)
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Abstract
An atomic flux measurement device for measuring the amount of dissociated atomic flux produced by discharge and emitted from a plasma generation cell into a vacuum camber. The atomic flux measurement device includes a counter electrode body including a pair of first and second sheet-like electrodes that are arranged substantially parallel to each other with a predetermined spacing between them, a direct-current power supply configured to maintain the first sheet-like electrode at a negative potential so that atoms attached to the inner surface of the sheet-like electrode undergo self-ionization and to apply a direct-current voltage between the first and second sheet-like electrodes so that a current flows between the first and second sheet-like electrodes, and a direct-current ammeter configured to measure a current flowing due to electrons emitted by the self-ionization of the dissociated atoms attached to the inner surface of the first sheet-like electrode.

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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
THE DOSHISHA | 601 GEMBU-CHO KARASUMA-HIGASHI-IRU IMADEGAWA-DORI KAMIGYO-KU KYOTO-SHI KYOTO 602-8580 | |
ARIOS INC | 2-20 MUSASHINO 3-CHOME AKISHIMA-SHI TOKYO 1960021 |
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Ariyada, Osamu | Tokyo, JP | 2 | 1 |
Ohachi, Tadashi | Kyoto, JP | 4 | 23 |
Wada, Motoi | Kyoto, JP | 4 | 14 |
Yamabe, Nobuhiko | Kyoto, JP | 1 | 0 |
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