Drop pattern generation for imprint lithography with directionally-patterned templates

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United States of America Patent

PATENT NO 9651862
SERIAL NO

14329381

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Abstract

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Imprint lithography methods that incorporate depositing droplets of polymerizable material in patterns that improve fill time performance when employing directionally-oriented imprint templates. The patterns are based on grid arrays formed of repeating sets of rows of droplets oriented along fast and slow axes, with droplets of each row offset along the slow axis relative to droplets in adjacent rows.

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Patent Owner(s)

Patent OwnerAddress
CANON NANOTECHNOLOGIES INCPO BOX 81536 AUSTIN TX 78708

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fletcher, Edward Brian Austin, US 45 359
Im, Se-Hyuk Austin, US 14 55
Khusnatdinov, Niyaz Round Rock, US 65 667
Liu, Weijun Cedar Park, US 78 565
Schmid, Gerard M Albany, US 35 341
Srinivasan, Yeshwanth Austin, US 6 34
Xu, Frank Y Round Rock, US 174 2481

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