Binary photomask blank, preparation thereof, and preparation of binary photomask
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United States of America Patent
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May 16, 2017
Grant Date -
Jan 21, 2016
app pub date -
Jul 14, 2015
filing date -
Jul 15, 2014
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Abstract
A binary photomask blank has a light-shielding film on a transparent substrate, the light-shielding film composed mainly of transition metal M and Si, or M, Si and N, and having an optical density of at least 3.0. The light-shielding film includes a layer containing M, Si and N so as to meet the formula: B≦0.68×A+0.23 wherein A is an atomic ratio M/Si and B is an atomic ratio N/Si, and has a thickness of up to 47 nm. The binary photomask blank has a thin light-shielding film capable of fully shielding exposure light.
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