Absolute position measurement method, absolute position measurement apparatus and scale
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United States of America Patent
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May 16, 2017
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Nov 13, 2014
filing date -
May 15, 2012
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Abstract
Provided are an absolute position measurement method, an absolute position measurement apparatus, and a scale. The scale includes a scale pattern formed by replacing repeatedly arranged pseudo-random-codes with a sequence of a linear feedback shift register of N stages using a first symbol with first width representing a first state and a second symbol with second width representing a second state. The first is divided into two or more first symbol areas of different structures, and the second symbol is divided into two or more second symbol areas of different structures. There is at least one overlap area in which the first symbol and the second symbol overlap each other to have the same structure.
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