Large area seed crystal for ammonothermal crystal growth and method of making

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United States of America Patent

PATENT NO 9650723
SERIAL NO

14249708

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Abstract

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Large area seed crystals for ammonothermal GaN growth are fabricated by deposition or layer transfer of a GaN layer on a CTE-matched handle substrate. The sides and back of the handle substrate are protected from the ammonothermal growth environment by a coating comprising an adhesion layer, a diffusion barrier layer, and an inert layer. A patterned mask, also comprising an adhesion layer, a diffusion barrier layer, and an inert layer, may be provided over the GaN layer to allow for reduction of the dislocation density by lateral epitaxial growth.

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Patent Owner(s)

Patent OwnerAddress
SLT TECHNOLOGIES INCC/O LOEB & LOEB 10100 SANTA MONICA BLVD SUITE 2200 LOS ANGELES CA 90067

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
D'Evelyn, Mark P Santa Barbara, US 113 5838
Jiang, Wenkan Santa Barbara, US 14 153
Kamber, Derrick S Goleta, US 31 735
Krames, Michael R Mountain View, US 176 8569
Pakalapati, Rajeev T Santa Barbara, US 2 37

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