In-situ capping with no loss of water depth
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 16, 2017
Grant Date -
Apr 30, 2015
app pub date -
Jan 5, 2015
filing date -
Feb 9, 2009
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method of remediating contaminated sediment area. The sediment has an initial water depth and comprises water and fine-grained solids. The contaminated sediment is contained in place by installing over the contaminated sediment an in-situ cap having a total thickness TCP. The contaminated sediment, and optionally any uncontaminated subsurface, is then consolidated until the total settlement of the contaminated and uncontaminated sediment exceeds the thickness TCP of the in-situ cap. The sediment is consolidated by installing a vertical barrier along the perimeter of the contaminated sediment area, installing a plurality of horizontal line drains into the sediment, connecting the horizontal line drains to a vacuum source, installing an in-situ cap over the contaminated sediment area and over the upper edge of the vertical barrier, and applying vacuum pressure to the horizontal line drains to dewater and consolidate the sediment.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully