Large area nanopatterning method and apparatus
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United States of America Patent
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May 9, 2017
Grant Date -
Jun 28, 2012
app pub date -
Mar 9, 2012
filing date -
Jan 22, 2008
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Abstract
Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cylinder. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the substrate is in contact or close proximity with the substrate. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cylinder surface comprises metal nano holes or nanoparticles.
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