Emitter structure, gas ion source and focused ion beam system

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United States of America Patent

PATENT NO 9640361
APP PUB NO 20150357147A1
SERIAL NO

14830106

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Abstract

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A focused ion beam system includes a gas ion source and an emitter structure. The emitter structure includes a pair of conductive pins fixed to a base member, a filament connected between the pair of conductive pins, and an emitter which has a tip end with one atom or three atoms and which is connected to the filament. A supporting member is fixed to the base material, and the emitter is connected to the supporting member.

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Patent Owner(s)

Patent OwnerAddress
HITACHI HIGH-TECH SCIENCE CORPORATION24-14 NISHI-SHIMBASHI 1-CHOME MINATO-KU TOKYO 105-0003

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Oba, Hiroshi Tokyo, JP 30 94
Sugiyama, Yasuhiko Tokyo, JP 50 243
Yasaka, Anto Tokyo, JP 20 83

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