Bismuth oxide-based addictive for laser marking
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United States of America Patent
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May 2, 2017
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Apr 17, 2014
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May 20, 2013
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Abstract
The present invention is directed to a bismuth oxide-based additive for laser marking containing oxygen-deficient bismuth oxide represented by the general formula: Bi2O(3-x) (provided that x is 0.01 or more and 0.3 or less and x represents the amount of oxygen deficiency calculated according to the formula: x=3−O1s/Bi4f×2 from the ratio (O1s/Bi4f) of the peak area attributed to the 1s electrons of oxygen bonded to bismuth to the peak area attributed to the 4f electrons of bismuth obtained by X-ray photoelectron spectrometry), which enables marking with excellent blackness and contrast without causing undesirable coloration of a resin composition regardless of the type or shape of a resin to be used.
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