Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound
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United States of America Patent
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Apr 18, 2017
Grant Date -
Nov 14, 2013
app pub date -
Jul 16, 2013
filing date -
Jan 18, 2011
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Abstract
A chemical amplification resist composition contains: (A) a polymer compound having a structure where a hydrogen atom of a phenolic hydroxyl group is replaced by a group having a non-acid-decomposable polycyclic alicyclic hydrocarbon structure; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.
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