Composition for production of metal film, method for producing metal film and method for producing metal powder

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United States of America Patent

PATENT NO 9624581
APP PUB NO 20110183068A1
SERIAL NO

13121005

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Abstract

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A composition that includes a high-valent compound of copper, silver or indium; a linear, branched or cyclic C1-18 alcohol; and a Group VIII metal catalyst forms a metal film of copper, silver or indium on a substrate when the composition is coated on the substrate and heated to reduce the high-valent compound. The composition may alternatively include metal particles of silver, copper or indium in which the surface layer of the particle includes a high-valent compound of copper, silver or indium. A metal film of copper, silver or indium may also be formed on a substrate by coating a substrate with the composition including the metal particles, and heating to reduce the high-valent compound in the same manner as above.

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Patent Owner(s)

Patent OwnerAddress
TOSOH CORPORATIONYAMAGUCHI 746-8501
SAGAMI CHEMICAL RESEARCH INSTITUTE2743-1 HAYAKAWA AYASE-SHI KANAGAWA 252-1193

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Inase, Toshio Kanagawa, JP 6 42
Kawabata, Takahiro Kanagawa, JP 8 53
Kinoshita, Tomoyuki Kanagawa, JP 19 203
Oshima, Noriaki Kanagawa, JP 21 568
Yamakawa, Tetsu Kanagawa, JP 11 534

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