Apparatus and method for fast evaluation of electroplating formulation performance in microvia filling

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United States of America Patent

PATENT NO 9617653
SERIAL NO

14105154

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Abstract

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The presently claimed invention provides an electrochemical analytical apparatus and a method for evaluating performance of electroplating formulations of electrolyte solutions used for via filling. The electrochemical analytical apparatus comprises an electric power generating device, an electrical output signal measurement device, an electrochemical measurement device, and a motion generator. The electrochemical measurement device of the present invention comprises a supporting structure, a cavity, a cavity electrode, and a surface electrode. The electrical output signals of the cavity electrode and the surface electrode are measured during electroplating for calculating a filling performance value. The presently claimed invention provides an accurate, fast and cost effective method for evaluating performance of electroplating formulations, following with choosing the electroplating formulation of the highest FP value for actual microvia filling process.

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Patent Owner(s)

Patent OwnerAddress
HONG KONG APPLIED SCIENCE AND TECHNOLOGY RESEARCH INSTITUTE COMPANY LIMITED5/F PHOTONICS CENTRE 2 SCIENCE PARK EAST AVENUE HONG KONG SCIENCE PARK SHATIN NEW TERRITORIES HONG KONG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gao, Min Hong Kong, HK 64 398
Gao, Minghui Hong Kong, HK 8 18
Sun, Yaofeng Hong Kong, HK 12 21
Yau, Shu Kin Hong Kong, HK 9 11

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