Coating packaged chamber parts for semiconductor plasma apparatus
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United States of America Patent
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Apr 11, 2017
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app pub date -
Oct 29, 2013
filing date -
Oct 29, 2012
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Abstract
An advanced coating for parts used in plasma processing chamber. The advanced coating is formed over an anodized surface that has not been sealed. After the coating is formed, the coated area is masked, and the remaining anodized surface is sealed. The porous and rough structure of the anodized but un-sealed aluminum enhances adhesion of the coating. However, to prevent particle generation, the exposed anodized surface is sealed after formation of the coating. The coating can be of yttria, formed by plasma enhanced atomic deposition techniques which results in a dense and smooth coating.
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