Large area imprint lithography

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United States of America Patent

PATENT NO 9616614
APP PUB NO 20130214452A1
SERIAL NO

13773217

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Abstract

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Methods and systems are provided for patterning polymerizable material dispensed on flexible substrates or flat substrates using imprint lithography techniques. Template replication methods and systems are also presented where patterns from a master are transferred to flexible substrates to form flexible film templates. Such flexible film templates are then used to pattern large area flat substrates. Contact between the imprint template and substrate can be initiated and propagated by relative translation between the template and the substrate.

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Patent Owner(s)

Patent OwnerAddress
CITIBANK N A388 GREENWICH STREET NEW YORK NY 10013

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ahn, Se Hyun Austin, US 16 193
Choi, Byung-Jin Austin, US 194 2163
GanapathiSubramanian, Mahadevan Cedar Park, US 18 268
Miller, Michael N Austin, US 48 790
Sreenivasan, Sidlgata V Austin, US 214 5594

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