Method and system for design of enhanced edge slope patterns for charged particle beam lithography
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United States of America Patent
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Apr 4, 2017
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Mar 11, 2016
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Feb 28, 2011
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Abstract
A method and system for fracturing or mask data preparation are presented in which a set of shots is determined for a multi-beam charged particle beam writer. The edge slope of a pattern formed by the set of shots is calculated. An edge of the pattern which has an edge slope below a target level is identified, and the dosage of a beamlet in a shot in the set of shots is increased to improve the edge slope. The improved edge slope remains less than the target level.
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