ZnO film production system and production method using ZnO film production system having heating units and control device

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United States of America Patent

PATENT NO 9611545
APP PUB NO 20150225846A1
SERIAL NO

14417196

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Abstract

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A ZnO film production method includes: disposing a substrate on an installation base; and, while supplying chlorine gas from a chlorine gas supply source to a first raw material storing part R1 and supplying oxygen gas from a third gas supply source (oxygen gas supply source) G3 into a reaction container, controlling heating units (heaters H1, H2 and H3) with a control device CONT such that temperature T1 of the first raw material storing part R1, temperature T2 of a second raw material storing part R2 and temperature T3 of the installation base on which the substrate is disposed satisfy a relationship of T123. Thus, according to the production method of the present disclosure, it is possible to produce a high-quality ZnO film.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325
NATIONAL UNIVERSITY CORPORATION TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY3-8-1 HARUMI-CHO FUCHU-SHI TOKYO 183-8538

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kang, Song yun Tokyo, JP 24 190
Koukitu, Akinori Tokyo, JP 38 242
Kumagai, Yoshinao Tokyo, JP 28 183

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