Substrate processing device and substrate processing method

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United States of America Patent

PATENT NO 9607867
APP PUB NO 20160240406A1
SERIAL NO

15137347

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Abstract

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The invention provides a substrate processing device and a substrate processing method for cooling a substrate, which are capable of conveying a substrate in a cleaner condition. A substrate cooling device serving as a substrate processing device of an embodiment of the invention includes: a chamber; a cooling unit which performs cooling; a substrate holder which is provided with a substrate mounting surface for mounting a substrate inside the chamber, and is cooled by the cooling unit; and a shield which is provided with a side surface portion surrounding a lateral side of the substrate mounting surface inside the chamber, and is cooled by the cooling unit. Moreover, a shield heater is provided in the vicinity of a surface on the inside of the shield.

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Patent Owner(s)

Patent OwnerAddress
CANON ANELVA CORPORATION2-5-1 KURIGI ASAO-KU KAWASAKI-SHI KANAGAWA-KEN 2158550

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kajihara, Yuji Kawasaki, JP 9 46

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