Fluorine-containing compound, substrate for pattern formation, photodegradable coupling agent, pattern formation method, and compound
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United States of America Patent
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Mar 28, 2017
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app pub date -
Mar 2, 2015
filing date -
Sep 4, 2012
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Abstract
A fluorine-containing compound represented by a following general formula (1) is provided. [In the general formula (1), X represents a halogen atom or an alkoxy group, R1 represents a branched chain or cyclic alkyl group having 3 to 10 carbon atoms, and Rf1 and Rf2 represent fluorinated alkoxy groups. n represents an integer of 0 or greater.]
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