Photosensitive resin composition and application thereof

United States of America Patent

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Mar 28, 2017
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Feb 23, 2017
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Aug 8, 2016
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Aug 19, 2015

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Abstract

A photosensitive resin composition includes an alkali-soluble resin (A), a compound having an unsaturated vinyl group (B), a photo initiator (C), solvent (D) and a silane compound (E) having a structure shown as formula (I):

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CHI MEI CORPORATION	59-1 SAN CHIA JEN TE TAINAN CITY 71702

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G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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Inventor Name	Address	# of filed Patents	Total Citations
Chen, I-Kuang	New Taipei, TW	3	2
Tsai, Yu-Jie	Tainan, TW	9	23

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Photosensitive resin composition and application thereof

Number of patents in Portfolio can not be more than 2000

United States of America Patent

15231771

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PATENT NO	9606436
APP PUB NO	20170052446A1
SERIAL NO	15231771
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
March 28, 2017	US,9606436,B2 US9606436B2	GRANTED PATENT AS SECOND PUBLICATION
February 23, 2017	US,20170052446,A1 US20170052446A1	FIRST PUBLISHED PATENT APPLICATION

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15231771

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