Low haze film formers for top coat nail polish
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United States of America Patent
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Mar 28, 2017
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app pub date -
Jan 22, 2016
filing date -
Jan 22, 2016
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Abstract
A top coat nail polish formulation comprising a primary film-forming polymer, a secondary film-forming polymer, a plasticizer and a solvent yields a haze free film upon drying. The secondary film-forming polymer is prepared by a reaction methacrylic acid, alkylacrylate, and of methyl methacrylate, at selected ratios. The alkylacrylate comprises a branched alkyl group with 4 to 12 carbons, or a mixture of branched alkyl groups and optionally linear alkyl group. The haze of the dried top coat film depends on the presence of methacrylic acid, ratio of alkylacrylate to methyl methacrylate, the number of carbons in the alkyl group on the alkylacrylate, and the branching of the alkyl group.
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