Method of etching

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United States of America Patent

PATENT NO 9601341
APP PUB NO 20150179468A1
SERIAL NO

14577442

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Abstract

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A method of etching a feature in a substrate includes forming a mask structure over the substrate, the mask structure defining at least one re-entrant opening, etching the substrate through the opening to form the feature using a cyclic etch and deposition process, and removing the mask.

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Patent Owner(s)

Patent OwnerAddress
SPTS TECHNOLOGIES LIMITEDCOED RHEDYN RINGLAND WAY NEWPORT NP18 2TA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ashraf, Huma Newport, GB 16 498

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  • 1 Citation Count
  • H01L Class
  • 18.50 % this patent is cited more than
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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges26979357140748325312788503629173801 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +050010001500200025003000350040004500500055006000650070007500800085009000950010000

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