Method for forming pattern and catalyst and electronic element using method therefor

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United States of America Patent

PATENT NO 9593427
APP PUB NO 20160108536A1
SERIAL NO

14651903

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Abstract

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Provided are a method for forming a pattern, and a catalyst and an electronic element using the method. The method for forming a pattern comprises the steps of: preparing, on a surface, a substrate sequentially including a photoconductive material layer and an oxide layer; making an area, on which a pattern is to be formed, on the oxide layer of the substrate, come into contact with an electrolyte; connecting the substrate and the electrolyte to a first electrode and a second electrode connected to a power source, respectively; and selectively irradiating light from a light source to the electrolyte and applying a voltage to the first electrode or the second electrode, thereby directly forming the pattern on the oxide layer of the substrate.

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Patent Owner(s)

Patent OwnerAddress
SNU R&DB FOUNDATIONCROWN 1 YUE YUE ROAD SEOUL KOREA SEOUL SEOUL
GLOBAL FRONTIER CENTER FOR MULTISCALE ENERGY SYSTEMS1 GWANAK-RO GWANAK-GU SEOUL 08826

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chung, Taek Dong Gwacheon-si, KR 12 59
Lim, Sung Yul Seoul, KR 1 0

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