Surfactants with lower CMC, and surfactant systems and detergents containing said surfactants
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United States of America Patent
Stats
-
Mar 14, 2017
Grant Date -
Nov 26, 2015
app pub date -
Jul 30, 2015
filing date -
Feb 1, 2013
priority date (Note) -
In Force
status (Latency Note)
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Abstract
The invention relates to surfactants of the formula (I), in which R1 stands for —H or —CH3; R2, R3, R4, R5, R6 independently stand for —H, —CH3, —CH2CH3, —CH2CH2CH3, —CH(CH3)2, —CH2CH2CH2CH3, —CH2CH(CH3)2, —CH(CH3)CH2CH3, —C(CH3)3, —OH, —OCH3, —OCH2CH3, —OCH2CH2CH3, —OCH(CH3)2, a linear or branched alkyl group containing 8 to 20 C atoms, or —SO3−X+; X+ stands for a monovalent cation or the nth part of an n-valent cation; exactly one radical R2, R3, R4, R5, R6 stands for —SO3−X+; and exactly one radical R2, R3, R4, R5, R6 stands for a linear or branched alkyl radical containing 8 to 20 C atoms.
First Claim
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International Classification(s)
- 2015 Application Filing Year
- C07C Class
- 3384 Applications Filed
- 2748 Patents Issued To-Date
- 81.21 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- C07C Class
- 0 % this patent is cited more than
- 8 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Sep 14, 2028 |
