Method of making a graphene base transistor with reduced collector area

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United States of America Patent

PATENT NO 9590081
SERIAL NO

14952422

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Abstract

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A method of making a graphene base transistor with reduced collector area comprising forming a graphene material layer, forming a collector material, depositing a dielectric, planarizing the dielectric, cleaning and removing the native oxide, transferring a base graphene material layer to the top surface of the graphene material layer, bonding the base graphene material layer, and photostepping and defining a second graphene material layer. A method of making a graphene base transistor with reduced collector area comprising forming an electron injection region, forming an electron collection region, and forming a base region. A graphene base transistor with reduced collector area comprising an electron emitter region, an electron collection region, and a base region.

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Patent OwnerAddress
THE GOVERNMENT OF THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY COMPANY875 NORTH RANDOLPH STREET SUITE 1425 ARLINGTON VA 22203

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Anderson, Travis J Alexandria, US 52 746
Koehler, Andrew D Alexandria, US 25 593
Kub, Francis J Arnold, US 110 4131

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