Plasma generation source including belt-type magnet and thin film deposition system using this
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United States of America Patent
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Mar 7, 2017
Grant Date -
May 8, 2014
app pub date -
Jun 1, 2012
filing date -
Jun 9, 2011
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Abstract
The present invention is a plasma generation source and a thing that is in its application and it is for getting high quality thin film by generating even high density plasma in high vacuum and like this plasma generation source applying like this plasma generation source to sputtering system, neutral particle beam source, thin film deposition system combining sputtering system and neutral particle beam source. According to the present invention, it generates plasma by using microwave through the microwave irradiating equipment and magnetic field by more than one pair of the belt type magnets and above goal can be accomplished maximizing plasma confinement effect by inducing electron returning trajectory in accordance with above continuous structure on belt type magnet.
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