Utilizing three overlapping images for exposure correction during panoramic image stitching
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United States of America Patent
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Mar 7, 2017
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app pub date -
May 8, 2014
filing date -
May 30, 2013
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Abstract
A method for panorama exposure correction can begin with the receiving of a hemispherical-coverage panoramic digital image set by a panoramic image stitching system. The hemispherical-coverage panoramic digital image set can be comprised of a ceiling image and at least three side images that are all captured simultaneously. The images of the image set can be aligned to create a panoramic image. Based on the alignment, overlapping regions between two adjacent side images and the ceiling image can be identified, the placement of blending seams can be determined, and the region of each image affected by a exposure correction can be determined. The exposure correction for each identified overlapping region can be determined. The exposure of the affected region of each image can then be adjusted in accordance with the determined exposure correction. A gradient blending can be performed for a predefined area across the blending seams.
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