Grid for plasma ion implant
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United States of America Patent
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Feb 28, 2017
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app pub date -
Mar 17, 2016
filing date -
Dec 19, 2012
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Abstract
A grid for minimizing effects of ion divergence in plasma ion implant. The plasma grid is made of a flat plate having a plurality of holes, wherein the holes are arranged in a plurality of rows and a plurality of columns thereby forming beamlets of ions that diverge in one direction. A mask is used to form the implanted shapes on the wafer, wherein the holes in the mask are oriented orthogonally to the direction of beamlet divergence.
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