Processes and apparatus for preparing heterostructures with reduced strain by radial distension

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United States of America Patent

PATENT NO 9583363
SERIAL NO

14142553

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Abstract

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Apparatus and processes for preparing heterostructures with reduced strain are disclosed. The heterostructures may include a semiconductor structure that conforms to a surface layer having a different crystal lattice constant than the structure to form a relatively low-defect heterostructure.

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GLOBALWAFERS CO LTDNO 8 INDUSTRIAL EAST ROAD 2 SCIENCE-BASED INDUSTRIAL PARK HSINCHU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Albrecht, Peter D O'Fallon, US 23 401
Falster, Robert J London, GB 88 1010
Pitney, John A O'Fallon, US 19 1083
Voronkov, Vladimir V Merano, IT 23 397

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  • 5 Citation Count
  • H01L Class
  • 18.50 % this patent is cited more than
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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges26979357140748325312788503629173801 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +050010001500200025003000350040004500500055006000650070007500800085009000950010000

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