Vapor deposition system and method
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United States of America Patent
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Feb 28, 2017
Issued Date -
N/A
app pub date -
Apr 22, 2016
filing date -
Feb 26, 2010
priority date (Note) -
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Abstract
A deposition system includes a system housing having a housing interior, a fixture transfer assembly having a generally sloped fixture transfer rail extending through the housing interior, a plurality of processing chambers connected by the fixture transfer rail, a controller interfacing with the processing chambers and at least one fixture carrier assembly carried by the fixture transfer rail and adapted to contain one substrate. The fixture carrier assembly travels along the fixture transfer rail under influence of gravity. A deposition method is also disclosed.
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