Positive-type photosensitive siloxane composition
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United States of America Patent
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Feb 28, 2017
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Oct 15, 2015
app pub date -
Nov 14, 2013
filing date -
Nov 22, 2012
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Abstract
A positive-type photosensitive siloxane composition which comprises (I) two or more polysiloxanes that differ in the rate of dissolution in aqueous tetramethylammonium hydroxide (TMAH) solutions, (II) a polysiloxane that gives a film which after prebaking has a rate of dissolution in 2.38 wt-% aqueous TMAH solution of 50-1,000 Å/sec and that has a group soluble in aqueous TMAH solution, other than silanol, (III) a diazonaphthoquinone derivative, and (IV) a solvent.
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