Compositions and processes for self-assembly of block copolymers
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United States of America Patent
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Feb 21, 2017
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Oct 16, 2015
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Oct 16, 2015
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Abstract
The present invention relates to novel copolymers containing cross-linkable and graft-able moieties, novel compositions comprised of these novel copolymers and a solvent, and methods for using these novel compositions to form neutral layer films which are both cross-linked and grafted on the substrate which are used in processes for aligning microdomains of block copolymers (BCP) on this neutral layer coated substrate such as self-assembly and directed self-assembly. The novel compositions are comprised of at least one novel random copolymer comprised of least one unit of structure (1), at least one unit of structure (2) at least one unit of structure (3) one H end group and one end group having structure (1′);
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