Manufacturing method and manufacturing equipment of thin film transistor substrate
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Feb 14, 2017
Grant Date -
Dec 1, 2016
app pub date -
Nov 28, 2014
filing date -
Nov 21, 2014
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A manufacturing method and a manufacturing equipment of a thin film transistor substrate are provided. In the manufacturing method, after forming a gate and a gate insulating layer of a thin film transistor, a semiconductor layer and a first protection layer are sequentially deposited. After patterning the first protection layer, the patterned first protection layer is used as a mask to pattern the semiconductor layer to form a semiconductor channel of the thin film transistor. By the above solution, the invention can reduce the number of mask and therefore is beneficial to reduce the cost.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully