Overlay operation method and overlay control method
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United States of America Patent
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Feb 14, 2017
Grant Date -
Oct 27, 2016
app pub date -
Apr 27, 2015
filing date -
Apr 27, 2015
priority date (Note) -
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Abstract
An overlay operation method and an overlay control method are disclosed. A first mark and a second mark are identified on a substrate, wherein the first mark and the second mark are formed by a process in combination with using a photomask. Next, a first measurement is performed to obtain an offset between the first mark and the second mark in a direction. Then, an operation is performed to judge whether the offset is in a range from a pre-determined offset minus a deviation to the pre-determined offset plus the deviation, wherein the pre-determined offset is determined by the photomask.
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