Method for producing a blank of fluorine-doped and titanium-doped glass having a high silicic-acid content and a blank produced according to the method
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United States of America Patent
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Feb 14, 2017
Grant Date -
Mar 24, 2016
app pub date -
Sep 23, 2015
filing date -
Sep 24, 2014
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Abstract
A method for producing a silica glass blank co-doped with titanium and fluorine for use in EUV lithography includes (a) producing a TiO2—SiO2 soot body by flame hydrolysis of silicon- and titanium-containing precursor substances, (b) fluorinating the TiO2—SiO2 soot body to form a fluorine-doped TiO2—SiO2 soot body, (c) treating the fluorine-doped TiO2—SiO2 soot body in a water vapor-containing atmosphere to form a conditioned soot body, and (d) vitrifying the conditioned soot body to form the blank. The blank has an internal transmission of at least 60% in the wavelength range of 400 to 700 nm at a sample thickness of 10 mm, a mean OH content in the range of 10 to 100 wt. ppm and a mean fluorine content in the range of 2,500 to 10,000 wt. ppm. Titanium is present in the blank in the oxidation forms Ti3+ and Ti4+.
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