Photosensitive resin composition and uses thereof

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United States of America Patent

PATENT NO 9568763
APP PUB NO 20150041735A1
SERIAL NO

14445764

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Abstract

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The invention relates to a photosensitive resin composition that has the advantages of high developability, good hardness, and good sputtered resistance. The invention also provides a method for manufacturing a color filter, color filter and a liquid crystal display device. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound containing an ethylenically unsaturated group (B), a photoinitiator (C), an organic solvent (D), a pigment (E), and a compound (F).

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Patent Owner(s)

Patent OwnerAddress
CHI MEI CORPORATION59-1 SAN CHIA JEN TE TAINAN CITY 71702

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hsu, Jung-Pin Tainan, TW 22 37
Wang, Duan-Chih Tainan, TW 4 9

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