Imprint method, imprint apparatus, and article manufacturing method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Feb 14, 2017
Issued Date -
N/A
app pub date -
Oct 20, 2015
filing date -
Oct 14, 2011
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An imprint method of forming a pattern of a resin on a substrate held on a holding surface. An uncured resin on the substrate is brought in contact with a mold. A partial region of the substrate is thermally deformed by irradiating the region with light so as to change an outer circumferential shape of the region. The uncured resin is cured on the region by irradiating light having a wavelength different from the deforming light. The mold is released from the cured resin on the region in contact with the mold. In at least a portion of a period during the deforming step, a region different from the region is held at a first suction force, while the region is held at a second suction force less than the first. The first suction force and the second suction force act between the substrate and the holding surface.
First Claim
Other Claims data not available
Family
International Classification(s)
- B41L:APPARATUS OR DEVICES FOR MANIFOLDING, DUPLICATING,....
- B82Y:SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; ....
- B29C:SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTAN....
- B29K:INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, ....
- G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....
- B29L:INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RE....
- 2015 Application Filing Year
- B41L Class
- 11 Applications Filed
- 9 Patents Issued To-Date
- 81.82 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- B41L Class
- 0 % this patent is cited more than
- 8 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Aug 14, 2028 |
