Spatial deposition of material using short-distance reciprocating motions
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United States of America Patent
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Jan 31, 2017
Grant Date -
Aug 6, 2015
app pub date -
Jan 23, 2015
filing date -
Feb 6, 2014
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Abstract
Deposition of material is performed on a substrate by causing short-distance reciprocating motions of the substrate that improve uniformity of material on the substrate. A series of reactors for injecting material onto the substrate is arranged along the length of the substrate in a repeating manner. During each reciprocating motion, the susceptor moves a distance shorter than an entire length of the substrate. Portions of the substrate are injected with materials by a subset of reactors. Since the movement of the substrate is smaller, a linear deposition device including the susceptor may be made smaller.
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