Deposition mask, producing method therefor and forming method for thin film pattern

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United States of America Patent

PATENT NO 9555434
SERIAL NO

15071125

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Abstract

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A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.

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Patent Owner(s)

Patent OwnerAddress
V TECHNOLOGY CO LTD134 GODO-CHO HODOGAYA-KU YOKOHAMA-SHI KANAGAWA 240-0005

International Classification(s)

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  • 2016 Application Filing Year
  • C23C Class
  • 3247 Applications Filed
  • 2111 Patents Issued To-Date
  • 65.02 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20162017201820192020202120222023202420250255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Aziz, Hany Maher Oakville, CA 8 63
Kajiyama, Koichi Yokohama, JP 49 408
Kajiyama, Yoshitaka Waterloo, CA 17 78
Kimura, Eriko Yokohama, JP 8 71
Kudo, Syuji Yokohama, JP 6 71
Mizumura, Michinobu Yokohama, JP 113 613
Sugimoto, Shigeto Yokohama, JP 4 54

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Patent Citation Ranking

  • 2 Citation Count
  • C23C Class
  • 27.20 % this patent is cited more than
  • 8 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges4219241045322915232201 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +0501001502002503003504004505005506006507007508008509009501000

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